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http://www.fabtech.org/content/view/6156/
Anchor text: New Product: Carl Zeiss SMTs ‘PROVE’ handles mask pattern alignment and registration at 32nm node - Fabtech - The online information source for semiconductor professionals<!-- Bot generated title -->
http://www.fabtech.org/news/_a/microscopy_resolution_record_claimed_by_carl_zeiss/
Anchor text: Fabtech.org: ''Microscopy resolution record claimed by Carl Zeiss''
http://www.fabtech.org/news/_a/tool_order_novellus_ships_300th_sabre_ecd_system/
Anchor text: Tool Order: Novellus ships 300th SABRE ECD system