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32 nm process
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Shallow trench isolation
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Three-dimensional integrated circuit
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Wikipedia Links
http://sst.pennnet.com/display_article/309943/5/ARTCL/none/none/1/Samsung-touts-30 nm-NAND-flash-using-double-patterning/
Anchor text: Samsung self-aligned double patterning technology
http://sst.pennnet.com/display_article/167270/5/ARTCL/none/none/1/Using-broadband-reflectometry-for-fast-trench-depth-measurement/
Anchor text: N and K Technologies: Shallow trench isolation